Thread View: ne.seminars
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Started by Fred Hapgood
Sat, 22 Jul 1995 00:00
Nanometer level positioning control
Author: Fred Hapgood
Date: Sat, 22 Jul 1995 00:00
Date: Sat, 22 Jul 1995 00:00
23 lines
1735 bytes
1735 bytes
MIT Nanotechnology Study Group 8-1-95 7:30pm NE43-773 (545 Tech Sq.) Tetsuo Ohara of Nanowave will talk about a significant new idea in nanometer-level positioning and control. Nanometer and sub-nanometer positioning and control techniques are needed not only for nanotechnology but the manufacture of the next generation of semiconductor devices, machine tools, data storage systems, X-ray optics, and micromachining processes. Current technology (laser interferometry) seems to be hitting its limits at a relatively crude 100 nanometers. The speaker will discuss a technique that will allow a gain of two to three orders of magnitude in this function. A product now being readied for prototype demonstration will offer 1 nanometer levels of resolution, lower costs, a robust adjustment to ambient vibration, and a working range of 12 inches along the X axis. Mr. Ohara believes the technology can be pushed to an accuracy of 1/3rd of a nanometer. (Some familiar with the technology suspect it can do even better.)
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