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1 total messages Started by Fred Hapgood Sat, 22 Jul 1995 00:00
Nanometer level positioning control
#88
Author: Fred Hapgood
Date: Sat, 22 Jul 1995 00:00
23 lines
1735 bytes
MIT Nanotechnology Study Group

8-1-95  7:30pm NE43-773 (545 Tech Sq.)


Tetsuo Ohara of Nanowave will talk about a significant new idea
in nanometer-level positioning and control.

Nanometer and sub-nanometer positioning and control techniques
are needed not only for nanotechnology but the manufacture of
the next generation of semiconductor devices, machine tools, data
storage systems, X-ray optics, and micromachining processes.
Current technology (laser interferometry) seems to be hitting 
its limits at a relatively crude 100 nanometers.

The speaker will discuss a technique that will allow a gain of two to
three orders of magnitude in this function.  A product now being
readied for prototype demonstration will offer 1 nanometer levels of
resolution, lower costs, a robust adjustment to ambient vibration, and
a working range of 12 inches along the X axis. Mr.  Ohara believes the
technology can be pushed to an accuracy of 1/3rd of a nanometer.
(Some familiar with the technology suspect it can do even better.)
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