Article View: sci.electronics
Article #16414Re: Microwave Oven Plasma Etcher?
From: Barry x24904/ER/167B-TED
Date: Wed, 06 Jan 1993 16:01
Date: Wed, 06 Jan 1993 16:01
35 lines
2695 bytes
2695 bytes
In article <15340.2b4a1345@ohstpy.mps.ohio-state.edu> edharris@ohstpy.mps.ohio-state.edu writes: >I'd like to use a small microwave oven ( will a small vacuum chamber inside) >to generate reactive plasmas ( O2 etc) for cleaning and etching in our lab. >The idea sort of works, but even the smallest ovens (400 Watts or so) >generate so much heat that they tend to burn samples more than etch them... >Does anyone know how to lower the power output of the magnatron, or is it >possible at all? I'd like to cut the power to 50W or so... Reducing the power of a home microwave oven is not practical. These things are designed to operate full on or full off. Their power supplies usually use special transformers with high leakage reactance to limit the current so if you change the tube operating conditions much, you will have to come up with a new power supply too. Magnetrons designed to operate over wide power ranges usually use external electromagnets so you can adjust the field as the voltages are varied. A company in California, Gerling Labs (recently sold to another company but I cannot remember the name), makes a nice variable power microwave system with waveguide output, directional power sensors, etc. rated for a few watts to 3 KW. It is probably overkill for your application. Finding Reike and Hartree diagrams for the tubes used in home ovens will be necessary if you plan to modify the power supply in your home-style oven. A simple suggestion would be to place a few beakers of water in your oven along with your etch cell. Much of the energy would go into heating the water. Barry ----------------- | ___ ________ | Dr. Barry L. Ornitz WA4VZQ | | / / | | Eastman Chemical Company | | / / | | ECC Research Laboratories, Engineering Research Div. | |< < K O D A K| | Process Instrumentation Research Laboratory | | \ \ | | P. O. Box 1972, Building 167B | |__\ \________| | Kingsport, TN 37662 (615/229-4904, FAX 615/229-4558) | | INTERNET: ornitz@kodak.com -----------------
Technical Details
Message-ID:
<1993Jan6.160107.19682@kodak.kodak.com>Path:
arc1-ca.pugleaf.net!sparky!uunet!cis.ohio-state.edu!zaphod.mps.ohio-state.edu!rphroy!caen!uwm.edu!rpi!newsserver.pixel.kodak.com!kodak!ornitzReferences:
<15340.2b4a1345@ohstpy.mps.ohio-state.edu>Show Full Headers
Complete Article Headers
Path: arc1-ca.pugleaf.net!sparky!uunet!cis.ohio-state.edu!zaphod.mps.ohio-state.edu!rphroy!caen!uwm.edu!rpi!newsserver.pixel.kodak.com!kodak!ornitz From: ornitz@kodak.kodak.com (Barry x24904/ER/167B-TED) Newsgroups: sci.electronics Subject: Re: Microwave Oven Plasma Etcher? Keywords: microwave, Reike and Hartree diagrams, Gerling Labs Message-ID: <1993Jan6.160107.19682@kodak.kodak.com> Date: 6 Jan 93 16:01:07 GMT References: <15340.2b4a1345@ohstpy.mps.ohio-state.edu> Sender: Barry L. Ornitz Followup-To: sci.electronics Organization: Eastman Chemical Company Lines: 35