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Article #16706Re: Microwave Oven Plasma Etcher? (definitions)
From: Carl Lowenstein
Date: Fri, 08 Jan 1993 16:51
Date: Fri, 08 Jan 1993 16:51
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In article <1ii7fgINNh20@shelley.u.washington.edu> whit@carson.u.washington.edu (John Whitmore) writes:
>In article <1993Jan7.005550.6869@kodak.kodak.com> ornitz@kodak.kodak.com (Barry x24904/ER/167B-TED) writes:
>
> In the context of the original question (lowering the power
>density in the microwave oven), this is irrelevant. First, the
>load is the contents of the microwave oven (and this can, we all know,
>vary quite a lot without stalling the oven). Second, we don't
>care about the exact frequency (nor the exact power); only large
>power-output changes are of interest.
Most of the higher class microwave ovens I have seen vary the (time)
average power output by varying the duty cycle of the magnetron.
Older ones do this on ten-second time scale (power knob changes the
duty cycle between 1 and 10 seconds out of every 10). Newer ones
with electronic controls seem to change the duty cycle on about a
1/4 second time scale. Maybe this would be helpful, depending on
the thermal time constant of your plasma etching process.
--
carl lowenstein marine physical lab u.c. san diego
{decvax|ucbvax} !ucsd!mpl!cdl cdl@mpl.ucsd.edu
clowenstein@ucsd.edu
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Newsgroups: sci.electronics Path: arc1-ca.pugleaf.net!sparky!uunet!zaphod.mps.ohio-state.edu!news.acns.nwu.edu!network.ucsd.edu!chiton!cdl From: cdl@chiton.ucsd.edu (Carl Lowenstein) Subject: Re: Microwave Oven Plasma Etcher? (definitions) Message-ID: <1993Jan8.165141.18098@chiton.ucsd.edu> Keywords: microwave, Reike and Hartree diagrams, Gerling Labs Organization: Marine Physical Lab, UC San Diego References: <rich.726361718@pencil> <1993Jan7.005550.6869@kodak.kodak.com> <1ii7fgINNh20@shelley.u.washington.edu> Date: Fri, 8 Jan 1993 16:51:41 GMT Lines: 23