In need of technical references !!!!!!

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#299

From: vxc15931
Date: Tue, 22 Dec 1992 13:59

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Can anyone of you provide me with references to the use of ultrasonics in
cleaning the surface of a silicon wafer?  I am currently working on a design
project involving the use of a megasonic system (currently employed by FSI) in
removing surface particulates in the order of 0.15 microns and larger.

The system I am trying to design uses a Multiple Array Liquid Coupled
Transducer to generate the agitation necessary for particulate removal.  Right
now, I am seeking out the equations which I need for my MathCAD simulation.
Unfortunately, my university library is not exactly well-stocked with the
proper literature.

So if you could recommended any literature in the area of ultrasonics being
used for surface decontamination (?), I would appreciate it very much.

Let me know if I haven't made my needs clear enough.

Thanks in advance!

==================

Jose' R.C. Cruz
Graduate Assistant
Department of Physics, Engineering and Technology
Mankato State University
Mankato, MN 56001

==================

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latter is preferable.

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Newsgroups: sci.materials
Subject: In need of technical references !!!!!!
Message-ID: <1992Dec22.075943.2623@vax1.mankato.msus.edu>
From: vxc15931@vax1.mankato.msus.edu
Date: 22 Dec 92 07:59:43 -0600
Organization: Mankato State University
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