🚀 go-pugleaf

Can anyone of you provide me with references to the use of ultrasonics in
cleaning the surface of a silicon wafer?  I am currently working on a design
project involving the use of a megasonic system (currently employed by FSI) in
removing surface particulates in the order of 0.15 microns and larger.

The system I am trying to design uses a Multiple Array Liquid Coupled
Transducer to generate the agitation necessary for particulate removal.  Right
now, I am seeking out the equations which I need for my MathCAD simulation.
Unfortunately, my university library is not exactly well-stocked with the
proper literature.

So if you could recommended any literature in the area of ultrasonics being
used for surface decontamination (?), I would appreciate it very much.

Let me know if I haven't made my needs clear enough.

Thanks in advance!

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Jose' R.C. Cruz
Graduate Assistant
Department of Physics, Engineering and Technology
Mankato State University
Mankato, MN 56001

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