Article View: sci.materials
Article #67Re: Negative resistance
From: Arun Rao
Date: Fri, 31 Jul 1992 19:29
Date: Fri, 31 Jul 1992 19:29
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2492 bytes
In article <13404@creare.COM>, kwg@creare.COM (Kent Goeking) writes: |> |> I would like to know if there are any materials that demonstrate negative |> resistance on the macroscopic scale. I am aware of this behavior in tunnel |> diodes but I wonder if it might not occur in other structures. |> |> For example, it seems plausible to me that the conductivity (albeit small) |> of a dielectric material may be sensitive to the electric field in unusual |> ways. If leakage currents are primarily carried along grain boundaries then |> perhaps if the material was piezoelectric, under a field these current paths |> might become more restricted due to increased internal stresses. Hence the |> resistance would increase with applied field. A plot of V vs I in this case |> would have negative slope and thus Ohms law would be rewritten V=-IR. |> |> Anyone know of such a material? Is it possible to design some sort of |> composite? Not sure what applications it would be good for but sure would |> be a unique capability. Gallium arsenide has a negative resistance region in its drift velocity / electric field characteristic which has been exploited to make two-terminal microwave oscillators -- the Gunn diode (nothing but a contact on either end of a piece of GaAs) is one example. I'm no longer up to date in the area, but I believe two terminal oscillators are still the only choice for 60 GHz+ frequencies -- especially when efficiency is not a major concern. -Arun |> |> |> |> |> -- |> ^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~^~ |> Kent Goeking (kwg@creare.com)| "We are continually faced with a series of |> Creare Inc., P.O. 71 | opportunities brilliantly disguised as |> Hanover, New Hampshire 03755 | insoluble problems" - John W. Gardner -- Arun Rao, PhD Senior Research Scientist Recognition & Information Processing Group Eastman Kodak Company 901 Elmgrove Road, Rochester, NY 14653-5722
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Path: arc1-ca.pugleaf.net!sparky!uunet!newsserver.pixel.kodak.com!kodak!eastman!!kodakr!gabber!rao From: rao@kodak.com (Arun Rao) Newsgroups: sci.materials Subject: Re: Negative resistance Message-ID: <3485@eastman.UUCP> Date: 31 Jul 92 19:29:47 GMT References: <13404@creare.COM> Sender: news@eastman.UUCP Reply-To: rao@kodak.com (Arun Rao) Organization: Image Processing Algorithms Laboratory, Eastman Kodak Co. Lines: 49