🚀 go-pugleaf

	I wonder whether somebody can suggest solutions to my 
problem. I pour either liquid gallium or a Ga-In eutectic in a container, 
and find that the surface (several feet across) is covered with a thick 
layer of oxide scum.  The problem occurs during stirring, that occurs 
just when I pour Ga After pouring, I do not stir the liquid again.
 I would like to get rid of the opaque oxide scum and get a shiny 
optical quality surface. Although it is in principle possible to work in 
an inert atmosphere and avoid the oxide, it is difficult to do so in 
practice, because of our setup. I know that, in an oxygen atmosphere, 
an oxide layer forms instantly but this is OK since the oxide layer that 
forms on an undisturbed surface is very thin and protects the Ga  
below from oxidation (like it does with Al). My real problem occurs at 
the moment of pouring since the liquid is stirred and we get too much 
thick messy oxide. Ideally, I would like to remove the oxide with 
chemical means, get a clean Ga surface that can be oxidized with the 
very thin layer of oxide that naturally forms on an undisturbed 
surface. 
I have tried to expose the oxide to HCl vapors. The surface becomes 
more reflective but its quality is not good enough for my application 
(using it as a an optical mirror).
	
If you have a suggestion, please email at borra@phy.ulaval.ca

				  Thanks,
E.F. Borra