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Started by kriman
Fri, 11 Sep 1992 09:03
Dr. Kenji Ebihara, Mon 14 Sept: Thin Films by Plasma-Enhanced MOCVD
Author: kriman
Date: Fri, 11 Sep 1992 09:03
Date: Fri, 11 Sep 1992 09:03
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2388 bytes
Seminar -- Center for Electronic and Electro-optic Materials (CEEM)
+--------------------------------------------------------------+
| Title: Thin Films by Plasma-Enhanced MOCVD |
| |
| Speaker: Dr. Kenji Ebihara |
| of: Kumamoto University, Japan |
+--------------------------------------------------------------+
Location: Room 414 of Bonner Hall, Amherst Campus of SUNYAB
Date: Tuesday, September 14, 1992
Time: 3:45 PM (Refreshments 3:30 PM)
Information: Prof. A. M. Kriman, (716) 645-3110
or: Maria Kuang, (716) 645-3119
Outline:
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(1) Plasma-Enhanced MOCVD
* plasma state * rf discharge
* microwave discharge * hybrid discharge system
(2) Thin-Film Preparation for Superconductors
* experimental systems * source materials
* controlled vapor feeder systems * optimum deposition conditions
(3) Superconducting and Structural Properties
* SEM * x-ray diffraction pattern
* EPMA * Temperature-resistance curve
(4) Spectroscopic Measurement for Processing Plasmas
* optical emission spectra * QMS measurement
* Decomposed species
(5) Comparison with Excimer Laser Ablation
* Pulsed Laser Deposition Systems used * Film properties
* Plume plasma properties
(6) Application to Current Limiter
* Current-voltage characteristics * Current-resistance characteristics
* Estimation of time-integrated power
(7) Silicon Dioxide Thin Film Preparation using PE-MOCVD
* Experimental set-up * Source materials
* Optical properties of the deposited films
(8) Summary
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